Wafer-Level Optical Metrology at Sub-Nanometre Repeatability: A Technical Note on Vibration Isolation

Authors

  • Filip Dossche Department of Metrology, Calestienne Centre for Emerging Materials, Couvin, Belgium Author
  • Charilaos Giannikos Department of Optical Engineering, Chios Centre for Emerging Materials, Chios, Greece Author
  • Kristaps-A Ernstsons Centre for Microfabrication, Kuldiga Centre for Emerging Materials, Kuldiga, Latvia Author

DOI:

https://doi.org/10.5281/zenodo.22673002

Keywords:

Wafer-Level Optical Metrology at Sub-Nanometre Repeatability; Next-generation R&D; Evidence synthesis; Reproducibility; Research methodology

Abstract

There is real interest in wafer-level optical metrology at sub-nanometre repeatability right now, and real uncertainty about exactly
where it delivers the most value. We pull together the current evidence for wafer-level optical metrology at sub-nanometre
repeatability, covering the methodological, practical, regulatory and cost angles, with an eye on where practice has genuinely
settled and where engineers and reviewers are still largely working it out for themselves. Selective, context-specific adoption looks
better supported by the evidence gathered here than either broad rollout or blanket avoidance

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Published

2023-09-03

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Vol. 2 No. 2 (2023): vol 2 issue 2 2023

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